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Nitrogen Trifluoride Market size surpassed $900 million in 2018 and will expect consumption of over 50 kilo tons by 2025. LED segment dominated the global market in 2018 and is anticipated to exhibit remarkable growth rate during the forecast period.
Rising nf3 demand, primarily used in a semiconductor, flat panel display, LED and solar PV cell industries as a chamber cleaning gas is projected to drive the nitrogen trifluoride market growth. Well established semiconductor industry in the U.S., high disposable income, high investments in research & development in electronics industry are the key driving factors of the market in North America.
Global semiconductors sales accounted for over USD 465 billion in 2018 driven by growing demand from computers, smartphones, supercomputers, medical diagnostic equipment and consumer electronics products containing various semiconductors which have a major impact on electronic special gases market. Growing semiconductor demand primarily in China, Japan, South Korea and South East Asian countries have enabled the nitrogen trifluoride (NF3) market growth for their applications in deposition, etching and chamber cleaning.
Report Attribute | Details |
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Base Year: | 2018 |
Nitrogen Trifluoride (NF3) Market Size in 2018: | 900 Million (USD) |
Forecast Period: | 2019 to 2025 |
Forecast Period 2019 to 2025 CAGR: | 11.7% |
2025 Value Projection: | 2 Billion (USD) |
Historical Data for: | 2014 to 2018 |
No. of Pages: | 135 |
Tables, Charts & Figures: | 99 |
Segments covered: | Application, and Region |
Growth Drivers: |
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Pitfalls & Challenges: |
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Taiwan electronic special gases industry accounted for around 19% of the Asia Pacific market share in 2018 owing to presence of major semiconductor & flat panel display fabrication facilities in the country indicates high penetration for NF3 in the application industries.
Benefits associated with NF3 such as reliability, safety, highest quality, advantages of relative ease of use at ambient conditions along with the ability to act as a fluorinating agent offers NF3 an advantage over other electronic special gases. As a result, the gas has gained commercial acceptance in electronics industry for its use in thermal and plasma cleaning applications owing to its advantages such as high etch rates, carbon-free etching, high selectivity, and minimal residual contamination, thereby driving the growth of nf3 industry.
Nitrogen trifluoride is increasingly used as a fluorine source in high-energy chemical lasers, on account of its ease of use as compared to fluorine gas. In addition, it is used as an intermediate in the production of specialized chemicals, fluorinating agent and as a gas in lamp which is projected to propel the nitrogen trifluoride market.