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Nitrogen Trifluoride (NF3) Market Analysis

  • Report ID: GMI4340
  • Published Date: Sep 2019
  • Report Format: PDF

Nitrogen Trifluoride Market Analysis

Semiconductors segment is likely to exceed USD 1.3 billion up to 2025 on account of their increasing usage in clean process chambers. A thin layer of semi conductive film is applied to wafers inside the chamber and the NF3 gas removes the residues that these films leave on the chamber walls so that the chambers can operate efficiently and manufactures a quality device. The relatively long life of fluorine radicals made in the plasma makes it an efficient cleaner, easier and safer to handle and helps reducing GHG emission have a positive impact on the nitrogen trifluoride market trends.

 

Flat panel display segment may exhibit gains at over 12% on account of growing flat panel display sector thereby rising demand for high-purity NF3 gases for chamber cleaning. The gas used for chamber cleaning application increases cost effectiveness and environmental efficiency of display manufacturing processes as well as support the next generation of display technology thereby propelling nitrogen trifluoride market demand.

 

LED segment is likely to exceed USD 120 million by 2025 owing to rapid growth in adoption of LED solid state lighting, driven by LCD TV backlighting and low-power general illumination applications. To meet expanding market for LED products, manufacturers need large amount of NF3 for larger LED fabs, which in turn may augment the NF3 market.

 

 

North America driven by the U.S., Canada and Mexico should surpass USD 190 million by 2025 owing to well-established semiconductor, LED and solar PV cell manufacturing industries in the region. High disposable income along with high spending on consumer electronics is projected to augment demand for semiconductor and electronics components which is projected to have positive impact on the NF3 market growth.
 

Europe, led by UK, Netherlands and Germany may witness substantial gains at over 9% during the projected time period owing to the rapid growth in semiconductor chips manufacturing in the region. Improved penetration of NF3 in semiconductor manufacturing for chamber cleaning and etching applications to remove residues on chamber walls is expected to propel the nitrogen trifluoride (NF3) market.
 

Asia Pacific, led by China, South Korea, and Japan might record gains at over 11% up to 2025 pertaining to the significant growth in electronics manufacturing industry. Increasing investment in establishment of semiconductor and flat panel display fabrication facilities in Singapore, Malaysia, Thailand, Philippines and Vietnam is expected to positively impact the nitrogen trifluoride industry growth. Cleaning of silicon residues from process chambers improves cell efficiency by controlling critical impurities along with the product performance which is projected to accelerate the gas demand in the region.

Authors: Kunal Ahuja, Sarita Bayas

Frequently Asked Questions (FAQ) :

The global nitrogen trifluoride industry is expected to achieve $2 billion by 2025 and is poised to record over 11.7% CAGR.

Growing demand for NF3 in manufacturing of flat panel display driven by growth of smartphones and tablets and rapidly growing semiconductor & LED manufacturing industry are the key factors expected to drive the growth of global industry.

Mitsui Chemicals, OCI Materials, American Gas Group, Air Products and Chemicals Inc., Foosung Co, Hyosung Co, Linde AG, Navin Fluorine International, Central Glass Co, Formosa Plastics, Kanto Denga Kogyo Co Ltd (KDK), Ulsan Chemical Co, Daesung, Matheson, BASF SE, Anderson Development, Praxair Technology, Inc. are key companies operating in the global industry for nitrogen trifluoride.

Asia Pacific NF3 market record gains at over 11% up to 2025 pertaining to the significant growth in electronics manufacturing industry.

Nitrogen Trifluoride (NF3) Market Scope

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Premium Report Details

  • Base Year: 2018
  • Companies covered: 17
  • Tables & Figures: 99
  • Countries covered: 13
  • Pages: 135
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