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High-k and ALD/CVD Metal Precursor Market Size
- Report ID: GMI780
- Published Date: Sep 2016
- Report Format: PDF
High-k and ALD/CVD Metal Precursor Market Size
High-k and ALD/CVD Metal Precursor Market size was over USD 220 million in 2015, it is set to surpass USD 950 million by 2024, at 17.8% CAGR over the forecast timeline.
Significant process development initiatives and high demand for improved semiconductor devices will drive high-k and ALD/CVD metal precursor market size in the coming years. Phase-Change Materials (PCM) have been deposited by physical vapor deposition techniques or other sputtering methods. These are inherently weak in terms of deposition uniformity. Therefore, alternative deposition methods like MOCVD have driven demand, which is mainly due to benefits of industrial scaling and compositional control.
Growing surface topography related complexity coupled with high aspect ratio has led to considerable need gto maintain a uniform coverage on top of the thin film surface. Innovative materials and nanotechnology device methodologies have seen improvements, which will aid development efforts. Industry application in the LED space represents considerable growth potential. Slow thin film formation rate may hamper industry size over the forecast timeline.
| Report Attribute | Details |
|---|---|
| Base Year: | 2015 |
| High-k and ALD/CVD Metal Precursor Market Size in 2015: | 220 Million (USD) |
| Forecast Period: | 2016 to 2024 |
| Forecast Period 2016 to 2024 CAGR: | 17.8% |
| 2024 Value Projection: | 965 Million (USD) |
| Historical Data for: | 2013 to 2015 |
| No. of Pages: | 88 |
| Tables, Charts & Figures: | 66 |
| Segments covered: | Technology and Region |
| Growth Drivers: |
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| Pitfalls & Challenges: |
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Frequently Asked Questions (FAQ) :
High-k and ALD/CVD Metal Precursor Market Scope
